Objektiv "Epiplan" IR 100x/0,9 Korr. (0-0,6) Si

Objective "Epiplan" IR 100x/0.9 Korr. (0-0.6) Si

Item no.: 442988-0000-000
(no longer available)
Description

Objective "Epiplan" IR 100x/0.9 Korr. (0-0.6) Si

Full Description

This objective has a working distance of 0.35 mm at a cover glass thickness of 0.3 mm silicon.

This objective for incident light brightfield features the M 27 threaded mount! This objective has been designed particularly for the infrared spectral range between 900 nm and 1,200 nm and for IR backside inspection, i.e. observation through the silicon wafer. It is mainly used at 1,064 nm (Nd-YAG-Laser) with the IR-LSM.

Magnification 100x
Numerical Aperture 0.9
Free Working Distance [mm] 0.35 at cover glass 0.3
Coverglass Thickness [mm] 0 - 0.6
Thread Type M27x0.75
Immersion Without Immersion
Field of View [mm] 20
Parfocal Length [mm] 45.215
Long Distance
Correction Ring Yes
Iris
Optical System Infinity Color Corrected System (ICS)
Color Correction achromatic
Biomedical Applications
Fluorescence Yes
- Multichannel
- Ultraviolet Transmission
- Infra Red Transmission
BrightField Yes
DIC [Differential Interference Contrast]
High Contrast DIC
PlasDIC
Phase Contrast
VAREL Contrast
Hoffman Modulation Contrast
Polarization Contrast
Materials (Reflected Light) Applications
BrightField Yes
BrightField/DarkField
Reflected Light DIC
High Contrast DIC
DIC with circular polarized light
Total Interference Contrast
Polarization Contrast
Options
Definite Focus.2
Confocal Microscopy Yes
- Ultra Violet
- VIS (visible light)
- NLO-IR / 2 Photon
Total Internal Reflection Fluorescence
Apotome
Microdissection
Mechanical Dimensions
Transmittance curve
Epiplan

Universal objectives for materials microscopy allowing brightfield, differential interference contrast and polarization methods. HD versions provide darkfield capability in addition. They feature the long working distances needed for materials inspections.

Objective "Epiplan" IR 100x/0.9 Korr. (0-0.6) Si