Objektiv "Epiplan" IR 100x/0,9 Korr. (0-0,6) Si
Objective "Epiplan" IR 100x/0.9 Korr. (0-0.6) Si
Item no.: 442988-0000-000(no longer available)
Objective "Epiplan" IR 100x/0.9 Korr. (0-0.6) Si
Full DescriptionThis objective has a working distance of 0.35 mm at a cover glass thickness of 0.3 mm silicon.
This objective for incident light brightfield features the M 27 threaded mount! This objective has been designed particularly for the infrared spectral range between 900 nm and 1,200 nm and for IR backside inspection, i.e. observation through the silicon wafer. It is mainly used at 1,064 nm (Nd-YAG-Laser) with the IR-LSM.
| Magnification | 100x |
| Numerical Aperture | 0.9 |
| Free Working Distance [mm] | 0.35 at cover glass 0.3 |
| Coverglass Thickness [mm] | 0 - 0.6 |
| Thread Type | M27x0.75 |
| Immersion | Without Immersion |
| Field of View [mm] | 20 |
| Parfocal Length [mm] | 45.215 |
| Long Distance | |
| Correction Ring |
|
| Iris | |
| Optical System | Infinity Color Corrected System (ICS) |
| Color Correction | achromatic |
| Biomedical Applications | |
|---|---|
| Fluorescence |
|
| - Multichannel | |
| - Ultraviolet Transmission | |
| - Infra Red Transmission | |
| BrightField |
|
| DIC [Differential Interference Contrast] | |
| High Contrast DIC | |
| PlasDIC | |
| Phase Contrast | |
| VAREL Contrast | |
| Hoffman Modulation Contrast | |
| Polarization Contrast | |
| Materials (Reflected Light) Applications | |
| BrightField |
|
| BrightField/DarkField | |
| Reflected Light DIC | |
| High Contrast DIC | |
| DIC with circular polarized light | |
| Total Interference Contrast | |
| Polarization Contrast | |
| Options | |
| Definite Focus.2 | |
| Confocal Microscopy |
|
| - Ultra Violet | |
| - VIS (visible light) | |
| - NLO-IR / 2 Photon | |
| Total Internal Reflection Fluorescence | |
| Apotome | |
| Microdissection | |
Note:
All measures in [mm]
mech. Arbeitsabstand = mechanical working distance
Deckglas = cover glass
Objektebene = object plane
Objektfeld = object field
Ausleuchtung = illumination
Probenzugänglichkeit = specimen accessibility
Note:
Please note that due to production tolerances, the given values are typical only and not guaranteed.
Universal objectives for materials microscopy allowing brightfield, differential interference contrast and polarization methods. HD versions provide darkfield capability in addition. They feature the long working distances needed for materials inspections.
Objective "Epiplan" IR 100x/0.9 Korr. (0-0.6) Si